Effective passivation of crystalline silicon surfaces by ultrathin atomic-layer-deposited TiOx layers
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
In: Titova, V.; Veith-Wolf, B.; Startsev, D.; Schmidt, J.: Effective passivation of crystalline silicon surfaces by ultrathin atomic-layer-deposited TiOx layers. In: Energy Procedia 124 (2017), S. 441-447. DOI: https://doi.org/10.1016/j.egypro.2017.09.272
- Ereignis
-
Veröffentlichung
- (wo)
-
Hannover, Hannover
- (wer)
-
Gottfried Wilhelm Leibniz Universität Hannover, Technische Informationsbibliothek (TIB)
- (wann)
-
2017
- Urheber
-
Titova, V.
Veith-Wolf, B.
Startsev, D.
Schmidt, J.
- DOI
-
10.15488/2268
- URN
-
urn:nbn:de:101:1-2020071616050890170381
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:46 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Beteiligte
- Titova, V.
- Veith-Wolf, B.
- Startsev, D.
- Schmidt, J.
- Gottfried Wilhelm Leibniz Universität Hannover, Technische Informationsbibliothek (TIB)
Entstanden
- 2017
Ähnliche Objekte (12)
Electronic characteristics of ultra‐thin passivation layers for silicon photovoltaics
Light induced curing (LIC) of passivation layers deposited on native silicon oxide
Effective passivation of black silicon surfaces by conformal thermal ALD deposited Al2O3 layers
Atomic Layer Deposition and Microanalysis of Ultrathin Layers
Growth Monitoring of Ultrathin Copper and Copper Oxide Films Deposited by Atomic Layer Deposition
Implementation of full-area-deposited electron-selective TiOx layers into silicon solar cells
Silica passivation layer on aluminium brazing sheets
Hybrid passivation layers for the use in power electronics
Photoluminescence and Stability of Sputtered SiOx Layers
Resolving the nanostructure of plasma-enhanced chemical vapor deposited nanocrystalline SiOx layers for application in solar cells
Comparison of ICP-AlOx and ALD-Al2O3 layers for the rear surface passivation of c-Si solar cells
Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors
Electronic characteristics of ultra‐thin passivation layers for silicon photovoltaics
Light induced curing (LIC) of passivation layers deposited on native silicon oxide
Effective passivation of black silicon surfaces by conformal thermal ALD deposited Al2O3 layers
Atomic Layer Deposition and Microanalysis of Ultrathin Layers
Growth Monitoring of Ultrathin Copper and Copper Oxide Films Deposited by Atomic Layer Deposition
Implementation of full-area-deposited electron-selective TiOx layers into silicon solar cells
Silica passivation layer on aluminium brazing sheets
Hybrid passivation layers for the use in power electronics
Photoluminescence and Stability of Sputtered SiOx Layers
Resolving the nanostructure of plasma-enhanced chemical vapor deposited nanocrystalline SiOx layers for application in solar cells
Comparison of ICP-AlOx and ALD-Al2O3 layers for the rear surface passivation of c-Si solar cells
Sputter Deposited Magnetostrictive Layers for SAW Magnetic Field Sensors
Electronic characteristics of ultra‐thin passivation layers for silicon photovoltaics
Light induced curing (LIC) of passivation layers deposited on native silicon oxide
Effective passivation of black silicon surfaces by conformal thermal ALD deposited Al2O3 layers
Atomic Layer Deposition and Microanalysis of Ultrathin Layers
Growth Monitoring of Ultrathin Copper and Copper Oxide Films Deposited by Atomic Layer Deposition
Implementation of full-area-deposited electron-selective TiOx layers into silicon solar cells
Silica passivation layer on aluminium brazing sheets
Hybrid passivation layers for the use in power electronics
Photoluminescence and Stability of Sputtered SiOx Layers
Resolving the nanostructure of plasma-enhanced chemical vapor deposited nanocrystalline SiOx layers for application in solar cells
Comparison of ICP-AlOx and ALD-Al2O3 layers for the rear surface passivation of c-Si solar cells