Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1990-2573
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Crystallization behavior of ion beam sputtered HfO2 thin films and its effect on the laser-induced damage threshold ; volume:17 ; number:1 ; day:6 ; month:3 ; year:2021 ; pages:1-8 ; date:12.2021
Journal of the European Optical Society / Rapid publications. Rapid publications / European Optical Society ; 17, Heft 1 (6.3.2021), 1-8, 12.2021
- Urheber
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Balogh-Michels, Zoltán
Stevanovic, Igor
Borzi, Aurelio
Bächli, Andreas
Schachtler, Daniel
Gischkat, Thomas
Neels, Antonia
Stuck, Alexander
Botha, Roelene
- Beteiligte Personen und Organisationen
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SpringerLink (Online service)
- DOI
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10.1186/s41476-021-00147-w
- URN
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urn:nbn:de:101:1-2021041920225756365992
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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14.08.2025, 10:45 MESZ
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Beteiligte
- Balogh-Michels, Zoltán
- Stevanovic, Igor
- Borzi, Aurelio
- Bächli, Andreas
- Schachtler, Daniel
- Gischkat, Thomas
- Neels, Antonia
- Stuck, Alexander
- Botha, Roelene
- SpringerLink (Online service)
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Determination of the laser-induced damage threshold of polymer optical fibers
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Assessment of Back‐End‐of‐Line Compatibility of Sputtered HfO 2 ‐Based Ferroelectrics
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Percolated Si:SiO2 Nanocomposites: Oven- vs. Millisecond Laser-induced Crystallization of SiOx Thin Films
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