Hochschulschrift
High energy boron implantation into different silicon substrates
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISBN
-
9783932749193
3932749197
- Maße
-
21 cm
- Umfang
-
VIII, 158 S.
- Ausgabe
-
1. Aufl.
- Sprache
-
Englisch
- Anmerkungen
-
graph. Darst.
Zugl.: München, Techn. Univ., Diss., 1998
- Erschienen in
-
Selected topics of semiconductor physics and technology ; Vol. 19
- Ereignis
-
Veröffentlichung
- (wo)
-
München
- (wer)
-
Walter-Schottky-Inst.
- (wann)
-
1998
- Urheber
-
Pech, Reiner
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.06.2025, 14:03 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
Beteiligte
- Pech, Reiner
- Walter-Schottky-Inst.
Entstanden
- 1998
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