Hochschulschrift
Work function enginneering for metal, high-K dielectric gate stacks
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Dimensions
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21 cm
- Extent
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XXVIII, 119 S.
- Language
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Deutsch
- Notes
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Ill., graph. Darst.
Erlangen, Nürnberg, Univ., Diss., 2011
- Classification
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Elektrotechnik, Elektronik
- Keyword
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Mikroelektronik ; Implantation ; High-k-Dielektrikum ; Titannitrid ; Hafnium
- Creator
- Table of contents
- Rights
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Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.03.2025, 12:18 PM CET
Data provider
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
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