Hochschulschrift
High-temperature CVD processes for crystalline silicon thin-film and wafer solar cells
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Anmerkungen
-
Konstanz, Univ., Diss., 2008
- Klassifikation
-
Elektrotechnik, Elektronik
- Schlagwort
-
Dünnschichtsolarzelle
APCVD-Verfahren
Silicium
Epitaxieschicht
Emitter
Getterung
APCVD-Verfahren ; Epitaxie ; Dünnschichtsolarzelle ; Silicium ; Kristallin ; Emitter ; Getterung
- Urheber
- URN
-
urn:nbn:de:bsz:352-opus-65498
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:46 MEZ
Datenpartner
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Objekttyp
- Hochschulschrift
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