Hochschulschrift
High-temperature CVD processes for crystalline silicon thin-film and wafer solar cells
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISBN
-
9783899638431
- Maße
-
22 cm, 286 gr.
- Umfang
-
VI, 180 S.
- Ausgabe
-
1. Aufl.
- Sprache
-
Englisch
- Anmerkungen
-
Ill., graph. Darst.
Zugl.: Konstanz, Univ., Diss., 2008
- Klassifikation
-
Elektrotechnik, Elektronik
- Schlagwort
-
Dünnschichtsolarzelle
APCVD-Verfahren
Silicium
Epitaxieschicht
Emitter
Getterung
APCVD-Verfahren ; Epitaxie ; Dünnschichtsolarzelle ; Silicium ; Kristallin ; Emitter ; Getterung
- Ereignis
-
Veröffentlichung
- (wo)
-
München
- (wer)
-
Verl. Dr. Hut
- (wann)
-
2008
- Urheber
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.06.2025, 13:51 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
Beteiligte
- Schmich, Evelyn Karin
- Verl. Dr. Hut
Entstanden
- 2008
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