Orthogonal‐Stacking Integration of Highly Conductive Silicide Nanowire Network as Flexible and Transparent Thin Films
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
Orthogonal‐Stacking Integration of Highly Conductive Silicide Nanowire Network as Flexible and Transparent Thin Films ; day:28 ; month:04 ; year:2023 ; extent:9
Advanced electronic materials ; (28.04.2023) (gesamt 9)
- Urheber
-
Yuan, Rongrong
Qian, Wentao
Zhang, Ying
Liu, Zongguang
Wang, Junzhuan
Xu, Jun
Chen, Kunji
Yu, Linwei
- DOI
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10.1002/aelm.202201185
- URN
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urn:nbn:de:101:1-2023042915152690033459
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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14.08.2025, 10:47 MESZ
Datenpartner
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Beteiligte
- Yuan, Rongrong
- Qian, Wentao
- Zhang, Ying
- Liu, Zongguang
- Wang, Junzhuan
- Xu, Jun
- Chen, Kunji
- Yu, Linwei
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