Orthogonal‐Stacking Integration of Highly Conductive Silicide Nanowire Network as Flexible and Transparent Thin Films

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Orthogonal‐Stacking Integration of Highly Conductive Silicide Nanowire Network as Flexible and Transparent Thin Films ; day:28 ; month:04 ; year:2023 ; extent:9
Advanced electronic materials ; (28.04.2023) (gesamt 9)

Creator
Yuan, Rongrong
Qian, Wentao
Zhang, Ying
Liu, Zongguang
Wang, Junzhuan
Xu, Jun
Chen, Kunji
Yu, Linwei

DOI
10.1002/aelm.202201185
URN
urn:nbn:de:101:1-2023042915152690033459
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 10:47 AM CEST

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Associated

  • Yuan, Rongrong
  • Qian, Wentao
  • Zhang, Ying
  • Liu, Zongguang
  • Wang, Junzhuan
  • Xu, Jun
  • Chen, Kunji
  • Yu, Linwei

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