Hochschulschrift
Device grade SiGe heterostructures grown by plasma assisted techniques
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISBN
-
9783832200244
383220024X
- Maße
-
21 cm
- Umfang
-
VIII, 111 S.
- Sprache
-
Englisch
- Anmerkungen
-
Ill., graph. Darst.
Zugl.: Zürich, Eidgenössische Techn. Hochsch., Diss., 2001
- Schlagwort
-
HEMT
Silicium
Germanium
Magnetronsputtern
Molekularstrahlepitaxie
PECVD-Verfahren
MOS-FET
Silicium
Germanium
Magnetronsputtern
Molekularstrahlepitaxie
PECVD-Verfahren
- Ereignis
-
Veröffentlichung
- (wo)
-
Aachen
- (wer)
-
Shaker
- (wann)
-
2002
- Urheber
-
Kummer, Matthias
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.06.2025, 13:59 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
Beteiligte
- Kummer, Matthias
- Shaker
Entstanden
- 2002
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