Comparison of EUV Photomask Metrology Between CD-AFM and TEM

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Location: Deutsche Nationalbibliothek Frankfurt am Main

ISSN: 2520-8128

Extent: Online-Ressource

Language: Englisch

Notes: online resource.

Bibliographic citation: Comparison of EUV Photomask Metrology Between CD-AFM and TEM ; day:3 ; month:2 ; year:2022 ; pages:1-10
Nanomanufacturing and metrology ; (3.2.2022), 1-10

Creator: Dai, Gaoliang
Hahm, Kai
Sebastian, Lipfert
Heidelmann, Markus

Contributor: SpringerLink (Online service)

DOI: 10.1007/s41871-022-00124-y

URN: urn:nbn:de:101:1-2022051218450234165134

Rights: Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 15.07.0008, 6:31 AM CET

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Dai, Gaoliang
Hahm, Kai
Sebastian, Lipfert
Heidelmann, Markus
SpringerLink (Online service)

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Comparison of EUV Photomask Metrology Between CD-AFM and TEM

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Other Objects (12)

Correction: Comparison of EUV Photomask Metrology Between CD-AFM and TEM

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