Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch Mask
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch Mask ; volume:4 ; number:4 ; day:24 ; month:1 ; year:2009 ; pages:364-370 ; date:4.2009
Nanoscale research letters ; 4, Heft 4 (24.1.2009), 364-370, 4.2009
- Urheber
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Lee, Youngjae
Koh, Kisik
Na, Hyungjoo
Kim, Kwanoh
Kang, Jeong-Jin
Kim, Jongbaeg
- Beteiligte Personen und Organisationen
-
SpringerLink (Online service)
- DOI
-
10.1007/s11671-009-9255-4
- URN
-
urn:nbn:de:101:1-2021081521460498109178
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:46 MESZ
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Beteiligte
- Lee, Youngjae
- Koh, Kisik
- Na, Hyungjoo
- Kim, Kwanoh
- Kang, Jeong-Jin
- Kim, Jongbaeg
- SpringerLink (Online service)
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