Influence of Surface Passivation on AlN Barrier Stress and Scattering Mechanism in Ultra-thin AlN/GaN Heterostructure Field-Effect Transistors

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISSN
1556-276X
Extent
Online-Ressource
Language
Englisch
Notes
online resource.

Bibliographic citation
Influence of Surface Passivation on AlN Barrier Stress and Scattering Mechanism in Ultra-thin AlN/GaN Heterostructure Field-Effect Transistors ; volume:11 ; number:1 ; day:23 ; month:8 ; year:2016 ; pages:1-6 ; date:12.2016
Nanoscale research letters ; 11, Heft 1 (23.8.2016), 1-6, 12.2016

Creator
Lv, Y. J.
Contributor
Song, X. B.
Wang, Y. G.
Fang, Y. L.
Feng, Z. H.
SpringerLink (Online service)

DOI
10.1186/s11671-016-1591-6
URN
urn:nbn:de:1111-2016092017686
Rights
Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 10:56 AM CEST

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Associated

  • Lv, Y. J.
  • Song, X. B.
  • Wang, Y. G.
  • Fang, Y. L.
  • Feng, Z. H.
  • SpringerLink (Online service)

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