Influence of Surface Passivation on AlN Barrier Stress and Scattering Mechanism in Ultra-thin AlN/GaN Heterostructure Field-Effect Transistors
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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Influence of Surface Passivation on AlN Barrier Stress and Scattering Mechanism in Ultra-thin AlN/GaN Heterostructure Field-Effect Transistors ; volume:11 ; number:1 ; day:23 ; month:8 ; year:2016 ; pages:1-6 ; date:12.2016
Nanoscale research letters ; 11, Heft 1 (23.8.2016), 1-6, 12.2016
- Creator
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Lv, Y. J.
- Contributor
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Song, X. B.
Wang, Y. G.
Fang, Y. L.
Feng, Z. H.
SpringerLink (Online service)
- DOI
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10.1186/s11671-016-1591-6
- URN
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urn:nbn:de:1111-2016092017686
- Rights
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 10:56 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Lv, Y. J.
- Song, X. B.
- Wang, Y. G.
- Fang, Y. L.
- Feng, Z. H.
- SpringerLink (Online service)