Hochschulschrift
Structural studies of reactive metal electrodes : dissolution and passivation of nickel and etching of aluminum
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Maße
-
21 cm
- Umfang
-
224 S.
- Sprache
-
Englisch
- Anmerkungen
-
Ill., graph. Darst.
Ulm, Univ., Diss., 2001
- Schlagwort
-
Nickel
Elektrode
Schwefelsäure
Elektrochemische Korrosion
Oberflächenanalyse
Aluminiumfolie
Schwefelsäure
Chloridion
Nassätzen
Oberflächenanalyse
- Urheber
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.06.2025, 13:37 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Objekttyp
- Hochschulschrift
Beteiligte
Ähnliche Objekte (12)
![Anodic dissolution of aluminum and anodic passivation in [EMIm]Cl-based ionic liquids](/assets/placeholder/searchResultMediaUnknown.png)
Anodic dissolution of aluminum and anodic passivation in [EMIm]Cl-based ionic liquids
Passivation of Si Surfaces by PECVD Aluminum Oxide
Comparison of the passivation quality of boron and aluminum BSF for wafers of varying thickness
Of etching and engraving
The renaissance of etching
Aluminum oxide for the surface passivation of high efficiency silicon solar cells : technology and advanced characterization
Chap. IV. Of Dissolution
Dissolution behaviour of beryl
In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride
Freeze etching of cells without cryoprotectants
Etching
Crystalline silicon surface passivation using aluminum oxide : fundamental understanding and application to solar cells
Anodic dissolution of aluminum and anodic passivation in [EMIm]Cl-based ionic liquids
Passivation of Si Surfaces by PECVD Aluminum Oxide
Comparison of the passivation quality of boron and aluminum BSF for wafers of varying thickness
Of etching and engraving
The renaissance of etching
Aluminum oxide for the surface passivation of high efficiency silicon solar cells : technology and advanced characterization
Chap. IV. Of Dissolution
Dissolution behaviour of beryl
In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride
Freeze etching of cells without cryoprotectants
Etching
Crystalline silicon surface passivation using aluminum oxide : fundamental understanding and application to solar cells
Anodic dissolution of aluminum and anodic passivation in [EMIm]Cl-based ionic liquids
Passivation of Si Surfaces by PECVD Aluminum Oxide
Comparison of the passivation quality of boron and aluminum BSF for wafers of varying thickness
Of etching and engraving
The renaissance of etching
Aluminum oxide for the surface passivation of high efficiency silicon solar cells : technology and advanced characterization
Chap. IV. Of Dissolution
Dissolution behaviour of beryl
In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride
Freeze etching of cells without cryoprotectants
Etching