Electrical and structural properties of p-type nanocrystalline silicon grown by LEPECVD for photovoltaic applications

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Location: Deutsche Nationalbibliothek Frankfurt am Main

Extent: Online-Ressource

Language: Englisch

Bibliographic citation: In: Physica status solidi / C ; 7 (2010), 3-4. - S. 712-715

Classification: Physik

Event: Veröffentlichung

(where): Konstanz

(who): Bibliothek der Universität Konstanz

(when): 2011

Contributor: Micard, Gabriel
Hahn, Giso
Terheiden, Barbara
Chrastina, Daniel
Isella, Giovanni
Moiseev, Tamara
Cavalcoli, Daniela
Cavallini, Anna
Binetti, Simona
Acciarri, Maurizio
Le Donne, Alessia
Texier, Michael
Pichaud, Bernard

URN: urn:nbn:de:bsz:352-opus-129861

Rights: Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 14.08.2025, 10:53 AM CEST

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Associated

Micard, Gabriel
Hahn, Giso
Terheiden, Barbara
Chrastina, Daniel
Isella, Giovanni
Moiseev, Tamara
Cavalcoli, Daniela
Cavallini, Anna
Binetti, Simona
Acciarri, Maurizio
Le Donne, Alessia
Texier, Michael
Pichaud, Bernard
Bibliothek der Universität Konstanz

Time of origin

2011

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Electrical and optical analysis of dielectric layers for advanced passivation of BBr3 diffused p+ emitters in n-type c-Si solar cells

Etch-back of p+ structures for selective boron emitters in n-type c-Si solar cells

Influence of the dopant on the contact formation to p+-type silicon

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Contacting and recombination analysis of boron emitters via etch-back for advanced n-Type Si solar cells

Multifunctional ICP-PECVD Silicon Nitride Layers for High-efficiency Silicon Solar Cell Applications

Passivation of Si wafers by Al2O3 films with different surface conditioning

Role of thermal SiO2 on passivation of highly doped layer

Investigation of radiation damage to the Al2O3

RF-Sputtered Ti-Based Dielectric Layers as Al-Diffusion Barrier for Passivating Contacts

Correlation of stress in silicon nitride layers with their complete removal by laser ablation

Bias-plasma Assisted RF Magnetron Sputter Deposition of Hydrogen-less Amorphous Silicon

Electrical and optical analysis of dielectric layers for advanced passivation of BBr3 diffused p+ emitters in n-type c-Si solar cells

Etch-back of p+ structures for selective boron emitters in n-type c-Si solar cells

Influence of the dopant on the contact formation to p+-type silicon

Review on screen printed metallization on p-type silicon

Contacting and recombination analysis of boron emitters via etch-back for advanced n-Type Si solar cells

Multifunctional ICP-PECVD Silicon Nitride Layers for High-efficiency Silicon Solar Cell Applications

Passivation of Si wafers by Al2O3 films with different surface conditioning

Role of thermal SiO2 on passivation of highly doped layer

Investigation of radiation damage to the Al2O3

RF-Sputtered Ti-Based Dielectric Layers as Al-Diffusion Barrier for Passivating Contacts

Correlation of stress in silicon nitride layers with their complete removal by laser ablation

Bias-plasma Assisted RF Magnetron Sputter Deposition of Hydrogen-less Amorphous Silicon

Electrical and optical analysis of dielectric layers for advanced passivation of BBr3 diffused p+ emitters in n-type c-Si solar cells

Etch-back of p+ structures for selective boron emitters in n-type c-Si solar cells

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Electrical and structural properties of p-type nanocrystalline silicon grown by LEPECVD for photovoltaic applications

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Other Objects (12)

Influence of the dopant on the contact formation to p+-type silicon

Review on screen printed metallization on p-type silicon

Contacting and recombination analysis of boron emitters via etch-back for advanced n-Type Si solar cells

Multifunctional ICP-PECVD Silicon Nitride Layers for High-efficiency Silicon Solar Cell Applications

Passivation of Si wafers by Al2O3 films with different surface conditioning

Role of thermal SiO<sub>2</sub> on passivation of highly doped layer

Investigation of radiation damage to the Al2O3

RF-Sputtered Ti-Based Dielectric Layers as Al-Diffusion Barrier for Passivating Contacts

Correlation of stress in silicon nitride layers with their complete removal by laser ablation

Bias-plasma Assisted RF Magnetron Sputter Deposition of Hydrogen-less Amorphous Silicon

Electrical and optical analysis of dielectric layers for advanced passivation of BBr3 diffused p+ emitters in n-type c-Si solar cells

Etch-back of p+ structures for selective boron emitters in n-type c-Si solar cells

Influence of the dopant on the contact formation to p+-type silicon

Review on screen printed metallization on p-type silicon

Contacting and recombination analysis of boron emitters via etch-back for advanced n-Type Si solar cells

Multifunctional ICP-PECVD Silicon Nitride Layers for High-efficiency Silicon Solar Cell Applications

Passivation of Si wafers by Al2O3 films with different surface conditioning

Role of thermal SiO<sub>2</sub> on passivation of highly doped layer

Investigation of radiation damage to the Al2O3

RF-Sputtered Ti-Based Dielectric Layers as Al-Diffusion Barrier for Passivating Contacts

Correlation of stress in silicon nitride layers with their complete removal by laser ablation

Bias-plasma Assisted RF Magnetron Sputter Deposition of Hydrogen-less Amorphous Silicon

Electrical and optical analysis of dielectric layers for advanced passivation of BBr3 diffused p+ emitters in n-type c-Si solar cells

Etch-back of p+ structures for selective boron emitters in n-type c-Si solar cells

Influence of the dopant on the contact formation to p+-type silicon

Review on screen printed metallization on p-type silicon

Contacting and recombination analysis of boron emitters via etch-back for advanced n-Type Si solar cells

Multifunctional ICP-PECVD Silicon Nitride Layers for High-efficiency Silicon Solar Cell Applications

Passivation of Si wafers by Al2O3 films with different surface conditioning

Role of thermal SiO<sub>2</sub> on passivation of highly doped layer

Investigation of radiation damage to the Al2O3

RF-Sputtered Ti-Based Dielectric Layers as Al-Diffusion Barrier for Passivating Contacts

Correlation of stress in silicon nitride layers with their complete removal by laser ablation

Bias-plasma Assisted RF Magnetron Sputter Deposition of Hydrogen-less Amorphous Silicon

Electrical and optical analysis of dielectric layers for advanced passivation of BBr3 diffused p+ emitters in n-type c-Si solar cells

Etch-back of p+ structures for selective boron emitters in n-type c-Si solar cells

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