Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films ; volume:7 ; number:1 ; day:5 ; month:1 ; year:2012 ; pages:1-5 ; date:12.2012
Nanoscale research letters ; 7, Heft 1 (5.1.2012), 1-5, 12.2012
- Urheber
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Hudaya, Chairul
Park, Ji Hun
Lee, Joong Kee
- Beteiligte Personen und Organisationen
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SpringerLink (Online service)
- DOI
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10.1186/1556-276X-7-17
- URN
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urn:nbn:de:101:1-2021082819041707340269
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:30 MESZ
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Beteiligte
- Hudaya, Chairul
- Park, Ji Hun
- Lee, Joong Kee
- SpringerLink (Online service)
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