Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films ; volume:7 ; number:1 ; day:5 ; month:1 ; year:2012 ; pages:1-5 ; date:12.2012
Nanoscale research letters ; 7, Heft 1 (5.1.2012), 1-5, 12.2012
- Creator
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Hudaya, Chairul
Park, Ji Hun
Lee, Joong Kee
- Contributor
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SpringerLink (Online service)
- DOI
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10.1186/1556-276X-7-17
- URN
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urn:nbn:de:101:1-2021082819041707340269
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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2025-08-15T07:30:48+0200
Data provider
This object is provided by:
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Hudaya, Chairul
- Park, Ji Hun
- Lee, Joong Kee
- SpringerLink (Online service)
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Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties
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