Improved uniformity and anisotropy of through-mask electrochemical micromachining by localized etching and homogeneous flow
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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1 Online-Ressource.
- Language
-
Englisch
- Bibliographic citation
-
Improved uniformity and anisotropy of through-mask electrochemical micromachining by localized etching and homogeneous flow ; volume:130 ; number:1-2 ; day:25 ; month:11 ; year:2023 ; pages:995-1002 ; date:1.2024
The international journal of advanced manufacturing technology ; 130, Heft 1-2 (25.11.2023), 995-1002, 1.2024
- Creator
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Jakob, Leonie
Eckert, Jonas
Podevijn, Carl
Kluska, Sven
Junginger, Mathias
Ranzinger, Christian
Bartsch, Jonas
- Contributor
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SpringerLink (Online service)
- DOI
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10.1007/s00170-023-12677-3
- URN
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urn:nbn:de:101:1-2024031408521462239464
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
14.08.2025, 11:01 AM CEST
Data provider
This object is provided by:
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Jakob, Leonie
- Eckert, Jonas
- Podevijn, Carl
- Kluska, Sven
- Junginger, Mathias
- Ranzinger, Christian
- Bartsch, Jonas
- SpringerLink (Online service)
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