Sub‐5 nm Patterning by Directed Self‐Assembly of Oligo (Dimethylsiloxane) Liquid Crystal Thin Films
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Sub‐5 nm Patterning by Directed Self‐Assembly of Oligo (Dimethylsiloxane) Liquid Crystal Thin Films ; volume:28 ; number:45 ; year:2016 ; pages:10068-10072 ; extent:5
Advanced materials ; 28, Heft 45 (2016), 10068-10072 (gesamt 5)
- Urheber
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Nickmans, Koen
Murphy, Jeffrey N.
de Waal, Bas
Leclère, Philippe
Doise, Jan
Gronheid, Roel
Broer, Dick J.
Schenning, Albert
- DOI
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10.1002/adma.201602891
- URN
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urn:nbn:de:101:1-2022110407130167662055
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:36 MESZ
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Beteiligte
- Nickmans, Koen
- Murphy, Jeffrey N.
- de Waal, Bas
- Leclère, Philippe
- Doise, Jan
- Gronheid, Roel
- Broer, Dick J.
- Schenning, Albert
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