Sub‐5 nm Patterning by Directed Self‐Assembly of Oligo (Dimethylsiloxane) Liquid Crystal Thin Films

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Sub‐5 nm Patterning by Directed Self‐Assembly of Oligo (Dimethylsiloxane) Liquid Crystal Thin Films ; volume:28 ; number:45 ; year:2016 ; pages:10068-10072 ; extent:5
Advanced materials ; 28, Heft 45 (2016), 10068-10072 (gesamt 5)

Creator
Nickmans, Koen
Murphy, Jeffrey N.
de Waal, Bas
Leclère, Philippe
Doise, Jan
Gronheid, Roel
Broer, Dick J.
Schenning, Albert

DOI
10.1002/adma.201602891
URN
urn:nbn:de:101:1-2022110407130167662055
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:36 AM CEST

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Associated

  • Nickmans, Koen
  • Murphy, Jeffrey N.
  • de Waal, Bas
  • Leclère, Philippe
  • Doise, Jan
  • Gronheid, Roel
  • Broer, Dick J.
  • Schenning, Albert

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