Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2045-2322
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Deep-UV photoinduced chemical patterning at the micro- and nanoscale for directed self-assembly ; volume:8 ; number:1 ; day:11 ; month:7 ; year:2018 ; pages:1-15 ; date:12.2018
Scientific reports ; 8, Heft 1 (11.7.2018), 1-15, 12.2018
- Urheber
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Leuschel, Benjamin
- Beteiligte Personen und Organisationen
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Gwiazda, Agnieszka
Heni, Wajdi
Diot, Frédéric
Yu, Shang-Yu
Bidaud, Clémentine
Vonna, Laurent
Ponche, Arnaud
Haidara, Hamidou
Soppera, Olivier
SpringerLink (Online service)
- DOI
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10.1038/s41598-018-28196-1
- URN
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urn:nbn:de:101:1-2018091620491970004644
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:27 MESZ
Datenpartner
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Beteiligte
- Leuschel, Benjamin
- Gwiazda, Agnieszka
- Heni, Wajdi
- Diot, Frédéric
- Yu, Shang-Yu
- Bidaud, Clémentine
- Vonna, Laurent
- Ponche, Arnaud
- Haidara, Hamidou
- Soppera, Olivier
- SpringerLink (Online service)
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