Scalable Fabrication of Highly Organized, Horizontally Aligned Sub‐5 nm Silicon Nanowires via Chemical Vapor Etching

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Location: Deutsche Nationalbibliothek Frankfurt am Main

Extent: Online-Ressource

Language: Englisch

Bibliographic citation: Scalable Fabrication of Highly Organized, Horizontally Aligned Sub‐5 nm Silicon Nanowires via Chemical Vapor Etching ; day:28 ; month:02 ; year:2025 ; extent:9
Small science ; (28.02.2025) (gesamt 9)

Creator: Seo, Juyeon
Feng, Peiyun
Li, Jianlin
Hong, Sanghyun
Gao, Sen
Byun, Ji Young
Jung, Yung Joon

DOI: 10.1002/smsc.202400627

URN: urn:nbn:de:101:1-2503011305229.794232148562

Rights: Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 15.08.2025, 7:33 AM CEST

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Seo, Juyeon
Feng, Peiyun
Li, Jianlin
Hong, Sanghyun
Gao, Sen
Byun, Ji Young
Jung, Yung Joon

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Scalable Fabrication of Highly Organized, Horizontally Aligned Sub‐5 nm Silicon Nanowires via Chemical Vapor Etching

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Other Objects (12)

Controlled Stepwise Wet Etching of Polycrystalline Mo Nanowires

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