Scalable Fabrication of Highly Organized, Horizontally Aligned Sub‐5 nm Silicon Nanowires via Chemical Vapor Etching
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Scalable Fabrication of Highly Organized, Horizontally Aligned Sub‐5 nm Silicon Nanowires via Chemical Vapor Etching ; day:28 ; month:02 ; year:2025 ; extent:9
Small science ; (28.02.2025) (gesamt 9)
- Urheber
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Seo, Juyeon
Feng, Peiyun
Li, Jianlin
Hong, Sanghyun
Gao, Sen
Byun, Ji Young
Jung, Yung Joon
- DOI
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10.1002/smsc.202400627
- URN
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urn:nbn:de:101:1-2503011305229.794232148562
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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15.08.2025, 07:33 MESZ
Datenpartner
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Beteiligte
- Seo, Juyeon
- Feng, Peiyun
- Li, Jianlin
- Hong, Sanghyun
- Gao, Sen
- Byun, Ji Young
- Jung, Yung Joon
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