Hochschulschrift
Current and future silicon based thin films structures for electronic applications : epitaxy and crystalline deposition on amorphous substrates
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Maße
-
30 cm
- Umfang
-
307 S.
- Sprache
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Englisch
- Anmerkungen
-
Ill., graph. Darst.
Erlangen, Nürnberg, Univ., Diss., 2001
- Schlagwort
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Silicium
Germanium
Heterostruktur
Epitaxieschicht
Gitterbaufehler
Silicium
Amorpher Zustand
Kristallisation
Laserinduziertes Verfahren
- Urheber
-
Christiansen, Silke H.
- Inhaltsverzeichnis
- Rechteinformation
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Letzte Aktualisierung
-
11.03.2025, 11:39 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Objekttyp
- Hochschulschrift
Beteiligte
- Christiansen, Silke H.
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