- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Deutsch
- Anmerkungen
-
In: Tagungsband 3. Symposium Elektronik und Systemintegration ESI, S. 81-86
- Schlagwort
-
Rauigkeit
Photoresist
Herstellung
München
- Ereignis
-
Veröffentlichung
- (wo)
-
Landshut
- (wer)
-
Hochschule für Angewandte Wissenschaften Landshut
- (wann)
-
2022
- Urheber
-
Rebhan, Matthias E.
- Beteiligte Personen und Organisationen
-
Artem, Ivanov
Marc, Bicker
Peter, Patzelt
- DOI
-
10.57688/364
- URN
-
urn:nbn:de:bvb:860-opus4-3641
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
25.03.2025, 13:52 MEZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Deutsche Nationalbibliothek. Bei Fragen zum Objekt wenden Sie sich bitte an den Datenpartner.
Beteiligte
- Rebhan, Matthias E.
- Artem, Ivanov
- Marc, Bicker
- Peter, Patzelt
- Hochschule für Angewandte Wissenschaften Landshut
Entstanden
- 2022
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