Tuning the crystallization temperature of titanium dioxide thin films by incorporating silicon dioxide via supercycle atomic layer deposition
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
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In: Surfaces and Interfaces 57: 105696 (2025)
- Ereignis
-
Veröffentlichung
- (wo)
-
Hamburg
- (wer)
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Technische Universität Hamburg. Universitätsbibliothek
- (wann)
-
2024
- Urheber
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Hedrich, Carina
Deduytsche, Davy
Petit, Robin
Krekeler, Tobias
Peng, Jun
Ritter, Martin
Dendooven, Jolien
Detavernier, Christophe
Blick, Robert H.
Zierold, Robert
- DOI
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10.15480/882.14468
- URN
-
urn:nbn:de:101:1-2502050226047.198877762060
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:26 MESZ
Datenpartner
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Beteiligte
- Hedrich, Carina
- Deduytsche, Davy
- Petit, Robin
- Krekeler, Tobias
- Peng, Jun
- Ritter, Martin
- Dendooven, Jolien
- Detavernier, Christophe
- Blick, Robert H.
- Zierold, Robert
- Technische Universität Hamburg. Universitätsbibliothek
Entstanden
- 2024
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