Tuning the crystallization temperature of titanium dioxide thin films by incorporating silicon dioxide via supercycle atomic layer deposition
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: Surfaces and Interfaces 57: 105696 (2025)
- Event
-
Veröffentlichung
- (where)
-
Hamburg
- (who)
-
Technische Universität Hamburg. Universitätsbibliothek
- (when)
-
2024
- Creator
-
Hedrich, Carina
Deduytsche, Davy
Petit, Robin
Krekeler, Tobias
Peng, Jun
Ritter, Martin
Dendooven, Jolien
Detavernier, Christophe
Blick, Robert H.
Zierold, Robert
- DOI
-
10.15480/882.14468
- URN
-
urn:nbn:de:101:1-2502050226047.198877762060
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
15.08.2025, 7:26 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Hedrich, Carina
- Deduytsche, Davy
- Petit, Robin
- Krekeler, Tobias
- Peng, Jun
- Ritter, Martin
- Dendooven, Jolien
- Detavernier, Christophe
- Blick, Robert H.
- Zierold, Robert
- Technische Universität Hamburg. Universitätsbibliothek
Time of origin
- 2024
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