Silicon Radical‐Induced CH 4 Dissociation for Uniform Graphene Coating on Silica Surface

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Silicon Radical‐Induced CH 4 Dissociation for Uniform Graphene Coating on Silica Surface ; day:30 ; month:11 ; year:2023 ; extent:10
Small ; (30.11.2023) (gesamt 10)

Creator
Pirabul, Kritin
Zhao, Qi
Pan, Zheng‐Ze
Liu, Hongyu
Itoh, Mutsuhiro
Izawa, Kenichi
Kawai, Makoto
Crespo‐Otero, Rachel
Di Tommaso, Devis
Nishihara, Hirotomo

DOI
10.1002/smll.202306325
URN
urn:nbn:de:101:1-2023120114565491097125
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:22 AM CEST

Data provider

This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.

Associated

  • Pirabul, Kritin
  • Zhao, Qi
  • Pan, Zheng‐Ze
  • Liu, Hongyu
  • Itoh, Mutsuhiro
  • Izawa, Kenichi
  • Kawai, Makoto
  • Crespo‐Otero, Rachel
  • Di Tommaso, Devis
  • Nishihara, Hirotomo

Other Objects (12)