Silicon Radical‐Induced CH 4 Dissociation for Uniform Graphene Coating on Silica Surface
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Silicon Radical‐Induced CH 4 Dissociation for Uniform Graphene Coating on Silica Surface ; day:30 ; month:11 ; year:2023 ; extent:10
Small ; (30.11.2023) (gesamt 10)
- Creator
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Pirabul, Kritin
Zhao, Qi
Pan, Zheng‐Ze
Liu, Hongyu
Itoh, Mutsuhiro
Izawa, Kenichi
Kawai, Makoto
Crespo‐Otero, Rachel
Di Tommaso, Devis
Nishihara, Hirotomo
- DOI
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10.1002/smll.202306325
- URN
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urn:nbn:de:101:1-2023120114565491097125
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:22 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Pirabul, Kritin
- Zhao, Qi
- Pan, Zheng‐Ze
- Liu, Hongyu
- Itoh, Mutsuhiro
- Izawa, Kenichi
- Kawai, Makoto
- Crespo‐Otero, Rachel
- Di Tommaso, Devis
- Nishihara, Hirotomo