Hochschulschrift

Design of volatile non halogenated precursors for the chemical vapor deposition (cvd) of copper: understanding key molecular properties in a cvd process feasibility study

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Location: Deutsche Nationalbibliothek Frankfurt am Main

ISBN: 9783831142743
3831142742

Dimensions: 22 cm

Extent: XII, 199 S.

Language: Englisch

Notes: Ill., graph. Darst.
Hergestellt on demand
Albany, Univ., Diss., 2002

Event: Veröffentlichung

(where): [Köln, Stolberger Straße 370]

(who): R. U. Claessen

(when): 2001

Creator: Claessen, Rolf U.

Table of contents: https://d-nb.info/96602169X/04

Rights: Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.

Last update: 11.06.2025, 2:27 PM CEST

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Object type

Hochschulschrift

Associated

Claessen, Rolf U.
R. U. Claessen

Time of origin

2001

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Design of volatile non halogenated precursors for the chemical vapor deposition (cvd) of copper: understanding key molecular properties in a cvd process feasibility study

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