Hochschulschrift

Atomistic simulations of silica by sequential and concurrent multiscale coupling : applications to solid/liquid and solid/solid interfaces = Atomistische Simulationen von Siliziumdioxid durch Multiskalenkoppelung

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Zusammenfassung: Silicon dioxide is one of the most abundant materials on earth, and many studies have been performed to study the chemical and physical properties of this complex, polar and polymorph-rich material. In this thesis, we employ atomistic simulation methods operating at different time- and lengths-scales in a so-called multiscale modelling approach. The findings reported in this thesis have impact on the simulation of glassy surfaces in contact with water and materials failure problems,including crack propagation in silica as well as the wear of diamond-cutting tools when machining silica
Zusammenfassung: Siliziumdioxid ist eines der am häufigsten Materialien, und wird in dieser Arbeit mit multiskaligen Ansätzen mit Hilfe von Computersimulationen untersucht. Anwendungen der darin vorgestellten Ergebnisse finden in verschiedenen materialwissenschaftlichen Fragestellungen (Adhäsion von Biomolekülen auf Glas, Sprödbruch von Glas, Diamantverschleiß bei der Bearbeitung von Siliziumdioxid.)

Alternative title
Atomistische Simulationen von Siliziumdioxid durch Multiskalenkoppelung
Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch
Notes
Albert-Ludwigs-Universität Freiburg, Dissertation, 2014

Classification
Physik
Keyword
Modellierung
Siliciumoxide
Atom
Quantenmechanik
Online-Ressource

Event
Veröffentlichung
(where)
Freiburg
(who)
Universität
(when)
2015
Creator
Contributor

URN
urn:nbn:de:bsz:25-opus-100380
Rights
Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
14.08.2025, 10:53 AM CEST

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Object type

  • Hochschulschrift

Associated

Time of origin

  • 2015

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