Role of electron and ion irradiation in a reliable lift-off process with electron beam evaporation and a bilayer PMMA resist system
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: 10.1116/6.0001161
- Event
-
Veröffentlichung
- (where)
-
Aachen
- (who)
-
Universitätsbibliothek der RWTH Aachen
- (when)
-
2021
- Creator
- DOI
-
10.18154/RWTH-2021-07816
- URN
-
urn:nbn:de:101:1-2021090807521484229704
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
15.08.2025, 7:35 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Sun, Bin
- Grap, Thomas
- Frahm, Thorben
- Scholz, Stefan
- Knoch, Joachim
- Universitätsbibliothek der RWTH Aachen
Time of origin
- 2021
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