Atomic layer deposition of vanadium oxide thin films from tetrakis(dimethylamino)vanadium precursor
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2044-5326
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Atomic layer deposition of vanadium oxide thin films from tetrakis(dimethylamino)vanadium precursor ; volume:32 ; number:1 ; day:9 ; month:9 ; year:2016 ; pages:37-44 ; date:1.2017
Journal of materials research ; 32, Heft 1 (9.9.2016), 37-44, 1.2017
- Urheber
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Wang, Xinwei
Guo, Zheng
Gao, Yuanhong
Wang, Jue
- Beteiligte Personen und Organisationen
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SpringerLink (Online service)
- DOI
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10.1557/jmr.2016.303
- URN
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urn:nbn:de:101:1-2021040420002544289221
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:47 MESZ
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Beteiligte
- Wang, Xinwei
- Guo, Zheng
- Gao, Yuanhong
- Wang, Jue
- SpringerLink (Online service)
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