Atomic layer deposition of vanadium oxide thin films from tetrakis(dimethylamino)vanadium precursor
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2044-5326
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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Atomic layer deposition of vanadium oxide thin films from tetrakis(dimethylamino)vanadium precursor ; volume:32 ; number:1 ; day:9 ; month:9 ; year:2016 ; pages:37-44 ; date:1.2017
Journal of materials research ; 32, Heft 1 (9.9.2016), 37-44, 1.2017
- Creator
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Wang, Xinwei
Guo, Zheng
Gao, Yuanhong
Wang, Jue
- Contributor
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SpringerLink (Online service)
- DOI
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10.1557/jmr.2016.303
- URN
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urn:nbn:de:101:1-2021040420002544289221
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 10:47 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Wang, Xinwei
- Guo, Zheng
- Gao, Yuanhong
- Wang, Jue
- SpringerLink (Online service)
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