Control of effective cooling rate upon magnetron sputter deposition of glassy Ge15Te85
- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
In: 10.1016/j.scriptamat.2019.11.024
- Ereignis
-
Veröffentlichung
- (wo)
-
Aachen
- (wer)
-
Universitätsbibliothek der RWTH Aachen
- (wann)
-
2019
- Urheber
- DOI
-
10.18154/RWTH-2020-02455
- URN
-
urn:nbn:de:101:1-2020110916380994069174
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:22 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Beteiligte
- Pries, Julian
- Wei, Shuai
- Hoff, Felix
- Lucas, Pierre
- Wuttig, Matthias
- Universitätsbibliothek der RWTH Aachen
Entstanden
- 2019
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