Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering ; volume:10 ; pages:1511-1522
Beilstein journal of nanotechnology ; 10, 1511-1522
- Classification
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Ingenieurwissenschaften und Maschinenbau
- DOI
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10.3762/bjnano.10.149
- URN
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urn:nbn:de:101:1-2020111914193003778013
- Rights
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:26 AM CEST
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Strain Effects by Surface Oxidation of Cu3N Thin Films Deposited by DC Magnetron Sputtering
Microstructure and properties of AlCr and AlCrFe coatings deposited by magnetron sputtering
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Growth of europium-doped gallium oxide (Ga2O3:Eu) thin films deposited by homemade DC magnetron sputtering
Pulsed bias effect on roughness of TiO2:Nb films deposited by grid assisted magnetron sputtering
Fabrication and study of ITO thin films prepared by magnetron sputtering
Fabrication and study of ito thin films prepared by magnetron sputtering
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Piezoelectric ZnO films deposited by RF magnetron sputtering for microfluidic applications
High Potential Columnar Nanocrystalline AlN Films Deposited by RF Reactive Magnetron Sputtering
Structural and optical properties of ZnS thin films deposited by RF magnetron sputtering
Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering
Strain Effects by Surface Oxidation of Cu3N Thin Films Deposited by DC Magnetron Sputtering
Microstructure and properties of AlCr and AlCrFe coatings deposited by magnetron sputtering
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Growth of europium-doped gallium oxide (Ga2O3:Eu) thin films deposited by homemade DC magnetron sputtering