Stitched passive CMOS strip sensors
Abstract: As a result of a CERN market survey, CMOS sensors in pixel and strip geometries were developed. The CMOS process is an established commercial industry process, which a lot of foundries utilize to produce silicon type devices. Typical CMOS foundries are equipped for bulk productions, but only for sensors much smaller than what is needed in e.g. the strip region of the ATLAS Inner Tracker. To produce large enough sensors, the process of stitching is utilized. The sensor structure is divided up into different regions, which individual wafer masks can imprint side by side onto the wafer to form a coherent area. With this method, the sensors can be nearly wafer-sized. The effects of stitching on charge collection, electric field strength and configuration, detection efficiency and radiation hardness have to be investigated.
The sensors discussed in this talk are stitched passive CMOS strip sensors produced by LFoundry in a 150 nm process with three different strip designs. The results of electrical IV characterisations, TCT and 90Sr-source measurements and the effects of radiation damages are discussed. The effects of the stitches on the sensors performance were also investigated.
The results of these measurements demonstrate that the stitching process works and introduces no negative effects on the sensors performance, before and after irradiation
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Event
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Veröffentlichung
- (where)
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Freiburg
- (who)
-
Universität
- (when)
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2023
- Creator
- Contributor
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Experimentelle Teilchenphysik, Abt. Prof. Karl Jakobs
Albert-Ludwigs-Universität Freiburg. Physikalisches Institut
- DOI
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10.6094/UNIFR/232016
- URN
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urn:nbn:de:bsz:25-freidok-2320165
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
25.03.2025, 1:44 PM CET
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Sorgenfrei, Niels
- Experimentelle Teilchenphysik, Abt. Prof. Karl Jakobs
- Albert-Ludwigs-Universität Freiburg. Physikalisches Institut
- Universität
Time of origin
- 2023
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Test beam analysis of irradiated stitched passive CMOS strip sensors
Investigation of nitrogen enriched silicon sensors and characterization of passive CMOS strip sensors
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Characterisation, simulation and test beam data analysis of stitched passive CMOS strip sensors
Status of the CMOS strip detector project in Freiburg
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Investigation of nitrogen enriched silicon sensors and characterization of passive CMOS strip sensors
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