Reducing the Impact of Bulk Doping on Transport Properties of Bi-Based 3D Topological Insulators
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
In: 10.1002/pssb.202000021
- Ereignis
-
Veröffentlichung
- (wo)
-
Aachen
- (wer)
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Universitätsbibliothek der RWTH Aachen
- (wann)
-
2020
- Urheber
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Jafarpisheh, Shaham
Ju, An
Janßen, Kevin
Taniguchi, Takashi
Watanabe, Kenji
Stampfer, Christoph
Beschoten, Bernd
- DOI
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10.18154/RWTH-2020-04266
- URN
-
urn:nbn:de:101:1-2021090807041019487461
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
15.08.2025, 07:24 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Beteiligte
- Jafarpisheh, Shaham
- Ju, An
- Janßen, Kevin
- Taniguchi, Takashi
- Watanabe, Kenji
- Stampfer, Christoph
- Beschoten, Bernd
- Universitätsbibliothek der RWTH Aachen
Entstanden
- 2020
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