Simulation of electron transport during electron-beam-induced deposition of nanostructures
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Erschienen in
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Simulation of electron transport during electron-beam-induced deposition of nanostructures ; volume:4 ; pages:781-792
Beilstein journal of nanotechnology ; 4, 781-792
- Klassifikation
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Ingenieurwissenschaften und Maschinenbau
- DOI
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10.3762/bjnano.4.89
- URN
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urn:nbn:de:101:1-2014052313639
- Rechteinformation
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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14.08.2025, 10:49 MESZ
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