Hochschulschrift
High-temperature CVD processes for crystalline silicon thin-film and wafer solar cells
- Location
-
Deutsche Nationalbibliothek Frankfurt am Main
- ISBN
-
9783899638431
- Dimensions
-
22 cm, 286 gr.
- Extent
-
VI, 180 S.
- Edition
-
1. Aufl.
- Language
-
Englisch
- Notes
-
Ill., graph. Darst.
Zugl.: Konstanz, Univ., Diss., 2008
- Classification
-
Elektrotechnik, Elektronik
- Keyword
-
Dünnschichtsolarzelle
APCVD-Verfahren
Silicium
Epitaxieschicht
Emitter
Getterung
APCVD-Verfahren ; Epitaxie ; Dünnschichtsolarzelle ; Silicium ; Kristallin ; Emitter ; Getterung
- Event
-
Veröffentlichung
- (where)
-
München
- (who)
-
Verl. Dr. Hut
- (when)
-
2008
- Creator
- Table of contents
- Rights
-
Bei diesem Objekt liegt nur das Inhaltsverzeichnis digital vor. Der Zugriff darauf ist unbeschränkt möglich.
- Last update
-
11.06.2025, 1:51 PM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Object type
- Hochschulschrift
Associated
- Schmich, Evelyn Karin
- Verl. Dr. Hut
Time of origin
- 2008
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