Optical examination of high contrast grating fabricated by focused-ion beam etching

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Location: Deutsche Nationalbibliothek Frankfurt am Main

ISSN: 1572-817X

Extent: Online-Ressource

Language: Englisch

Notes: online resource.

Bibliographic citation: Optical examination of high contrast grating fabricated by focused-ion beam etching ; volume:48 ; number:4 ; day:31 ; month:3 ; year:2016 ; pages:1-9 ; date:4.2016
Optical and quantum electronics ; 48, Heft 4 (31.3.2016), 1-9, 4.2016

Creator: Urbańczyk, Dominika

Contributor: Wójcik-Jedlińska, Anna
Muszalski, Jan
Łaszcz, Adam
Płuska, Mariusz
Gębski, Marcin
Czyszanowski, Tomasz
Czerwinski, Andrzej
Bugajski, Maciej
SpringerLink (Online service)

DOI: 10.1007/s11082-016-0544-8

URN: urn:nbn:de:1111-2016040120380

Rights: Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 14.08.2025, 11:00 AM CEST

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Associated

Urbańczyk, Dominika
Wójcik-Jedlińska, Anna
Muszalski, Jan
Łaszcz, Adam
Płuska, Mariusz
Gębski, Marcin
Czyszanowski, Tomasz
Czerwinski, Andrzej
Bugajski, Maciej
SpringerLink (Online service)

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Optical examination of high contrast grating fabricated by focused-ion beam etching

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Other Objects (12)

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