On‐Chip Arrayed Waveguide Grating Fabricated on Thin‐Film Lithium Niobate

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Herein, an on‐chip 8‐channel thin‐film lithium niobate (TFLN) arrayed waveguide grating (AWG) is designed and the device is fabricated using photolithography‐assisted chemo‐mechanical etching technique. The transmission of the fabricated TFLN AWG near the central wavelength of 1550 nm is experimentally measured. An on‐chip loss as low as 3.32 dB, a single‐channel bandwidth of 1.6 nm, and a total‐channel bandwidth of 12.8 nm are obtained. The cross talk between adjacent channels is measured to be below −3.83 dB within the wavelength range from 1543 to 1558 nm, and the cross talk between nonadjacent channels is below −15 dB.

Location: Deutsche Nationalbibliothek Frankfurt am Main

Extent: Online-Ressource

Language: Englisch

Bibliographic citation: On‐Chip Arrayed Waveguide Grating Fabricated on Thin‐Film Lithium Niobate ; day:02 ; month:11 ; year:2023 ; extent:5
Advanced photonics research ; (02.11.2023) (gesamt 5)

Creator: Wang, Zhe
Fang, Zhiwei
Liu, Zhaoxiang
Liang, Youting
Liu, Jian
Yu, Jianping
Huang, Ting
Zhou, Yuan
Zhang, Haisu
Wang, Min
Cheng, Ya

DOI: 10.1002/adpr.202300228

URN: urn:nbn:de:101:1-2023110314143243000942

Rights: Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 14.08.2025, 11:01 AM CEST

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Associated

Wang, Zhe
Fang, Zhiwei
Liu, Zhaoxiang
Liang, Youting
Liu, Jian
Yu, Jianping
Huang, Ting
Zhou, Yuan
Zhang, Haisu
Wang, Min
Cheng, Ya

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