Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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1556-276X
- Extent
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Online-Ressource
- Language
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Englisch
- Notes
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online resource.
- Bibliographic citation
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Crystallization of amorphous silicon thin films deposited by PECVD on nickel-metalized porous silicon ; volume:7 ; number:1 ; day:17 ; month:8 ; year:2012 ; pages:1-6 ; date:12.2012
Nanoscale research letters ; 7, Heft 1 (17.8.2012), 1-6, 12.2012
- Creator
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Ben Slama, Sonia
Hajji, Messaoud
Ezzaouia, Hatem
- Contributor
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SpringerLink (Online service)
- DOI
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10.1186/1556-276X-7-464
- URN
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urn:nbn:de:101:1-2019070419425252908675
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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14.08.2025, 10:56 AM CEST
Data provider
This object is provided by:
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Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Ben Slama, Sonia
- Hajji, Messaoud
- Ezzaouia, Hatem
- SpringerLink (Online service)
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