High-rate atomic layer deposition of Al2O3 for the surface passivation of Si solar cells

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Location: Deutsche Nationalbibliothek Frankfurt am Main

Extent: Online-Ressource

Language: Englisch

Bibliographic citation: In: Werner, F.; Stals, W.; Görtzen, R.; Veith, B.; Brendel, Rolf et al.: High-rate atomic layer deposition of Al2O3 for the surface passivation of Si solar cells. In: Energy Procedia 8 (2011), S. 301-306. DOI: https://doi.org/10.1016/j.egypro.2011.06.140

Event: Veröffentlichung

(where): Hannover, Hannover

(who): Gottfried Wilhelm Leibniz Universität Hannover, Technische Informationsbibliothek (TIB)

(when): 2011

Creator: Werner, Florian
Stals, Walter
Görtzen, Roger
Veith, Boris
Brendel, Rolf
Schmidt, Jan

DOI: 10.15488/1153

URN: urn:nbn:de:101:1-2020071506153344624453

Rights: Der Zugriff auf das Objekt ist unbeschränkt möglich.

Last update: 25.03.2025, 1:49 PM CET

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Associated

Werner, Florian
Stals, Walter
Görtzen, Roger
Veith, Boris
Brendel, Rolf
Schmidt, Jan
Gottfried Wilhelm Leibniz Universität Hannover, Technische Informationsbibliothek (TIB)

Time of origin

2011

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High-rate atomic layer deposition of Al2O3 for the surface passivation of Si solar cells

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Other Objects (12)

Influence of the SINx deposition temperature on the passivation quality of Al2O3/SINx stacks and the effect of blistering

Passivation of Si wafers by Al2O3 films with different surface conditioning

Chemistry of atomic layer deposition

Atomic layer deposition for high power laser applications: Al2O3 and HfO2

Plasma‐Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer

Al2O3 rear surface passivation for silicon ribbon solar cells

Atomic layer deposition of nanostructured materials

Influence of co-reactants on surface passivation by nanoscale hafnium oxide layers grown by atomic layer deposition on silicon

Effective passivation of black silicon surfaces by conformal thermal ALD deposited Al2O3 layers

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Area Selective Deposition of Ultrathin Magnetic Cobalt Films via Atomic Layer Deposition

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Passivation of Si wafers by Al2O3 films with different surface conditioning

Chemistry of atomic layer deposition

Atomic layer deposition for high power laser applications: Al2O3 and HfO2

Plasma‐Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer

Al2O3 rear surface passivation for silicon ribbon solar cells

Atomic layer deposition of nanostructured materials

Influence of co-reactants on surface passivation by nanoscale hafnium oxide layers grown by atomic layer deposition on silicon

Effective passivation of black silicon surfaces by conformal thermal ALD deposited Al2O3 layers

Metastable atomic layer deposition

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Passivation of Si wafers by Al2O3 films with different surface conditioning

Chemistry of atomic layer deposition

Atomic layer deposition for high power laser applications: Al2O3 and HfO2

Plasma‐Enhanced Atomic Layer Deposition of Al2O3 on Graphene Using Monolayer hBN as Interfacial Layer

Al2O3 rear surface passivation for silicon ribbon solar cells

Atomic layer deposition of nanostructured materials

Influence of co-reactants on surface passivation by nanoscale hafnium oxide layers grown by atomic layer deposition on silicon

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Atomic Layer Deposition and Microanalysis of Ultrathin Layers

Area Selective Deposition of Ultrathin Magnetic Cobalt Films via Atomic Layer Deposition

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