Investigating the Electromechanical Behavior of Unconventionally Ferroelectric Hf 0.5 Zr 0.5 O 2 ‐Based Capacitors Through Operando Nanobeam X‐Ray Diffraction
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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Investigating the Electromechanical Behavior of Unconventionally Ferroelectric Hf 0.5 Zr 0.5 O 2 ‐Based Capacitors Through Operando Nanobeam X‐Ray Diffraction ; volume:9 ; number:6 ; year:2023 ; extent:7
Advanced electronic materials ; 9, Heft 6 (2023) (gesamt 7)
- Urheber
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Stylianidis, Evgenios
Surabhi, Pranav
Hamming‐Green, Ruben
Salverda, Mart
Wei, Yingfen
Burema, Arjan
Matzen, Sylvia
Banerjee, Tamalika
Björling, Alexander
Mukherjee, Binayak
Dutta, Sangita
Aramberri, Hugo
Íñiguez, Jorge
Noheda, Beatriz
Carbone, Dina
Nukala, Pavan
- DOI
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10.1002/aelm.202201298
- URN
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urn:nbn:de:101:1-2023061416005409724838
- Rechteinformation
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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14.08.2025, 10:50 MESZ
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Beteiligte
- Stylianidis, Evgenios
- Surabhi, Pranav
- Hamming‐Green, Ruben
- Salverda, Mart
- Wei, Yingfen
- Burema, Arjan
- Matzen, Sylvia
- Banerjee, Tamalika
- Björling, Alexander
- Mukherjee, Binayak
- Dutta, Sangita
- Aramberri, Hugo
- Íñiguez, Jorge
- Noheda, Beatriz
- Carbone, Dina
- Nukala, Pavan
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