Fabrication of Stacked MoS2 Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- ISSN
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2045-2322
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Anmerkungen
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online resource.
- Erschienen in
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Fabrication of Stacked MoS2 Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer ; volume:9 ; number:1 ; day:11 ; month:4 ; year:2019 ; pages:1-7 ; date:12.2019
Scientific reports ; 9, Heft 1 (11.4.2019), 1-7, 12.2019
- Urheber
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Oh, Hye Min
Kim, Hyojung
Kim, Hyun
Jeong, Mun Seok
- Beteiligte Personen und Organisationen
-
SpringerLink (Online service)
- DOI
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10.1038/s41598-019-42446-w
- URN
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urn:nbn:de:101:1-2019042520593613597899
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 10:56 MESZ
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Beteiligte
- Oh, Hye Min
- Kim, Hyojung
- Kim, Hyun
- Jeong, Mun Seok
- SpringerLink (Online service)
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