Plasmon damping below the Landau regime: the role of defects in epitaxial graphene
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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In: Langer, T.; Baringhaus, J.; Pfnuer, H.; Schumacher, H. W.; Tegenkamp, C.: Plasmon damping below the Landau regime: the role of defects in epitaxial graphene. In: New Journal of Physics 12 (2010), 33017. DOI: https://doi.org/10.1088/1367-2630/12/3/033017
- Ereignis
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Veröffentlichung
- (wo)
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Hannover, Hannover
- (wer)
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Gottfried Wilhelm Leibniz Universität Hannover, Technische Informationsbibliothek (TIB)
- (wann)
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2010
- Urheber
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Langer, Thomas
Baringhaus, Jens
Pfnür, Herbert
Schumacher, H.W.
Tegenkamp, Christoph
- DOI
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10.15488/1308
- URN
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urn:nbn:de:101:1-2020072008472795550458
- Rechteinformation
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Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
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25.03.2025, 13:43 MEZ
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Beteiligte
- Langer, Thomas
- Baringhaus, Jens
- Pfnür, Herbert
- Schumacher, H.W.
- Tegenkamp, Christoph
- Gottfried Wilhelm Leibniz Universität Hannover, Technische Informationsbibliothek (TIB)
Entstanden
- 2010
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