Direct‐Patterning ZnO Deposition by Atomic‐Layer Additive Manufacturing Using a Safe and Economical Precursor
- Standort
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Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
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Online-Ressource
- Sprache
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Englisch
- Erschienen in
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In: Small 19.36 (2023). DOI:10.1002/smll.202301774
In: Small 19 : 36
- Klassifikation
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Elektrotechnik, Elektronik
- Ereignis
-
Veröffentlichung
- (wo)
-
Erlangen
- (wer)
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Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU)
- (wann)
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2023
- Urheber
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Stefanovic, Sonja
Gheshlaghi, Negar
Zanders, David
Kundrata, Ivan
Zhao, Baolin
Barr, Maïssa K. S.
Halik, Marcus
Devi, Anjana
Bachmann, Julien
- DOI
-
10.1002/smll.202301774
- URN
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urn:nbn:de:101:1-2024030104053639830272
- Rechteinformation
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
-
14.08.2025, 11:00 MESZ
Datenpartner
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Beteiligte
- Stefanovic, Sonja
- Gheshlaghi, Negar
- Zanders, David
- Kundrata, Ivan
- Zhao, Baolin
- Barr, Maïssa K. S.
- Halik, Marcus
- Devi, Anjana
- Bachmann, Julien
- Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU)
Entstanden
- 2023
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