Direct‐Patterning ZnO Deposition by Atomic‐Layer Additive Manufacturing Using a Safe and Economical Precursor
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
-
Online-Ressource
- Language
-
Englisch
- Bibliographic citation
-
In: Small 19.36 (2023). DOI:10.1002/smll.202301774
In: Small 19 : 36
- Classification
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Elektrotechnik, Elektronik
- Event
-
Veröffentlichung
- (where)
-
Erlangen
- (who)
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Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU)
- (when)
-
2023
- Creator
-
Stefanovic, Sonja
Gheshlaghi, Negar
Zanders, David
Kundrata, Ivan
Zhao, Baolin
Barr, Maïssa K. S.
Halik, Marcus
Devi, Anjana
Bachmann, Julien
- DOI
-
10.1002/smll.202301774
- URN
-
urn:nbn:de:101:1-2024030104053639830272
- Rights
-
Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
-
14.08.2025, 11:00 AM CEST
Data provider
This object is provided by:
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Stefanovic, Sonja
- Gheshlaghi, Negar
- Zanders, David
- Kundrata, Ivan
- Zhao, Baolin
- Barr, Maïssa K. S.
- Halik, Marcus
- Devi, Anjana
- Bachmann, Julien
- Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU)
Time of origin
- 2023
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