X-ray diffuse scattering from self-organized mesoscopic semiconductor structures

This monograph represents a critical survey about the outstanding capabilities of X-ray diffuse scattering for the structural characterization of mesoscopic materials systems. The mesoscopic regime comprises length scales ranging from a few up to some hundreds of nanometers and is of particular relevance at semiconductor layer systems where e.g. interface roughness or low- dimensional objects such as quantum dots and quantum wires have attracted much interest. An extensive overview of the present state-of-the-art theory of X-ray diffuse scattering at mesocopic structures is given followed by a valuable description of various experimental techniques. Selected up-to-date examples are discussed. The aim of the present book is to combine both aspects of self-organized growth of mesoscopic structures and respective X-ray diffuse scattering experiments. TOC:A Brief Introduction to the Topic.- BasicPrinciples of X-Ray Diffuse Scattering on Mesoscopic Structures.- Experimental Optimization.- A Model System: LPE SiGe/Si(001) Islands.- Dynamical Scattering at Grazing Incidence.- Characterization of Quantum Dots.- Characterization of Interface Roughness.- Appendix.

Location
Deutsche Nationalbibliothek Frankfurt am Main
ISBN
9783540201793
3540201793
Dimensions
24 cm
Extent
X, 202 S.
Language
Englisch
Notes
graph. Darst.
Literaturangaben

Bibliographic citation
Springer tracts in modern physics ; Vol. 199

Classification
Physik
Keyword
Halbleiter
Mesoskopisches System
Schichtwachstum
Selbstorganisation
Röntgenstreuung
Diffuse Streuung

Event
Veröffentlichung
(where)
Berlin, Heidelberg, New York, Hong Kong, London, Milan, Paris, Tokyo
(who)
Springer
(when)
2004
Creator

Table of contents
Rights
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Last update
11.06.2025, 2:14 PM CEST

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Associated

Time of origin

  • 2004

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