- Standort
-
Deutsche Nationalbibliothek Frankfurt am Main
- Umfang
-
Online-Ressource
- Sprache
-
Englisch
- Erschienen in
-
Very High Temperature Hall Sensors in a Wafer‐Scale 4H‐SiC Technology ; day:07 ; month:08 ; year:2024 ; extent:14
Advanced Materials Technologies ; (07.08.2024) (gesamt 14)
- Urheber
- DOI
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10.1002/admt.202400046
- URN
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urn:nbn:de:101:1-2408071430002.325039551684
- Rechteinformation
-
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Letzte Aktualisierung
- 14.08.2025, 10:50 MESZ
Datenpartner
Dieses Objekt wird bereitgestellt von:
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Beteiligte
- Okeil, Hesham
- Erlbacher, Tobias
- Wachutka, Gerhard
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