Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures

Location
Deutsche Nationalbibliothek Frankfurt am Main
Extent
Online-Ressource
Language
Englisch

Bibliographic citation
Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures ; volume:257 ; number:9 ; year:2020 ; extent:8
Physica status solidi / B. B, Basic solid state physics ; 257, Heft 9 (2020) (gesamt 8)

Creator
Jafari, Sahar
Steffens, Jonathan
Wendt, Michael
Terheiden, Barbara
Meyer, Sylke
Lausch, Dominik

DOI
10.1002/pssb.202000097
URN
urn:nbn:de:101:1-2022062707031694564636
Rights
Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
Last update
15.08.2025, 7:25 AM CEST

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Associated

  • Jafari, Sahar
  • Steffens, Jonathan
  • Wendt, Michael
  • Terheiden, Barbara
  • Meyer, Sylke
  • Lausch, Dominik

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