Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures
- Location
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Deutsche Nationalbibliothek Frankfurt am Main
- Extent
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Online-Ressource
- Language
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Englisch
- Bibliographic citation
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Occurrence of Sharp Hydrogen Effusion Peaks of Hydrogenated Amorphous Silicon Film and Its Connection to Void Structures ; volume:257 ; number:9 ; year:2020 ; extent:8
Physica status solidi / B. B, Basic solid state physics ; 257, Heft 9 (2020) (gesamt 8)
- Creator
- DOI
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10.1002/pssb.202000097
- URN
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urn:nbn:de:101:1-2022062707031694564636
- Rights
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Open Access; Der Zugriff auf das Objekt ist unbeschränkt möglich.
- Last update
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15.08.2025, 7:25 AM CEST
Data provider
Deutsche Nationalbibliothek. If you have any questions about the object, please contact the data provider.
Associated
- Jafari, Sahar
- Steffens, Jonathan
- Wendt, Michael
- Terheiden, Barbara
- Meyer, Sylke
- Lausch, Dominik